C&K Scientific and Technological Instruments Box Shadow Example
乙威科技國際有限公司  官網

 

 

      

                    

                    

 

      

      

      

                    

 

      

 

 

 

 

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19" Cylindrical PLD system with two target carousels
Base pressure better 5x-19 torr (Option for 5x-10 torr)
3" wafer substrate heater up to 1200 degree C @ ambient oxygen (wafer size up to 6")
higher temperature on request
6x1" or 3x2" target carousel with optional mask
Optional for high pressure RHEED, k-cells, sputtering gun, etc.