C&K Scientific and Technological Instruments Co.,Ltd. -- UHV PLD System, 超高真空脉冲激光沉积系统
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C&K Scientific and Technological Instruments Co.,Ltd.

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UHV
 

UHV PLD System

12" Spherical PLD system with base pressure < 5x10-10 torr
6x1" or 3x2" target carousel
Substrate heater up to 1200 degree C
Optional for oxygen environment heater
higher temperature on request
Optional for high pressure RHEED 

 

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